Advanced microlithography technologies
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.... lines are just undercut (the space is about 108 nm at the top and about 84 nm at the bottom), which is advantageous to the lift-off process. ... (a) schematic diagram; (b) SEM surface micrograph with a 1 10 nm wide Si Coulomb island ( the side gates are in the left and right of the ... The Ids-Vjs characteristics of the SET at different values of Vg (-10, 0, 10 V) measured at 2 K all show Coulomb staircases.
| Title | : | Advanced microlithography technologies |
| Author | : | Yangyuan Wang, Jun'en Yao, Christopher J. Progler, Zhongguo guang xue xue hui, Australian Optical Society |
| Publisher | : | Society of Photo Optical - 2005 |
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