1993 Japan IEMT symposium
Yasuo Iguchi and Takashi Kanamori Reseach Laboratory Reseach aamp; Development Oki Electric Industry Co., Ltd, 550-5. ... was used the etching rate of the polyimide was faster than that of the resist, but that the etching rate of the polyimide was faster than that of the resist when CF4 gas was used. ... Degree of Planarization (D.O.P.) Figure 1 shows a schematic diagram of degree of planarization (D.O.P.).
| Title | : | 1993 Japan IEMT symposium |
| Author | : | Society Components, Hybrids, and Manufac, symposium International electronic manufac |
| Publisher | : | - 1993 |
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